SYS-CON MEDIA Authors: Gilad Parann-Nissany, Srinivasan Sundara Rajan, Sean Houghton, Glenn Rossman, Ignacio M. Llorente

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ULVAC Launches the Optius Optical Process Monitor



For Various Types of Plasma Processes

Chigasaki, Kanagawa, Japan, April 10 - Optius optical process monitor (5-ch type)
Chigasaki, Kanagawa, Japan, Apr 10, 2014 - (ACN Newswire) - ULVAC, Inc. (Headquarters: Chigasaki, Kanagawa, Japan; President and CEO: Hisaharu Obinata; hereafter referred to as ULVAC) is pleased to announce that on April 10, 2014, starts sales of an optical process monitor, Optius, which can be used for various plasma processes.

Background

Plasma processes such as sputtering, CVD, and etching are used in many types of manufacturing systems for semiconductors, flat panel displays, and solar panels. In order to obtain high-quality and stable film deposition or etching, plasma emission spectra have to be accurately monitored to control the manufacturing system appropriately. There has been a growing demand for plasma process monitoring devices recently because their importance for quality control has been recognized.

Overview

The Optius optical process monitor was developed based on ULVAC's rich experience in film processing systems such as sputtering and etching systems. This product can be used to control various plasma processes such as transition mode control for reactive sputtering, etching endpoint detection, cleaning and initialization status checks for a CVD chamber, and impurities monitoring in processes.

Features

This new product has the following features:

1. Broad measurement wavelength range
Monitors a wide range of wavelengths (200-1000 nm). Capable of simultaneously measuring multiple wavelengths.

2. Simultaneous measurement of up to 5 channels
An expansion unit (optional) enables up to 5 channels to be measured simultaneously.

3. Feedback control
Feedback control of external equipment by using measurement results. Useful for transition mode control (gas flow control) in reactive sputtering.

4. Proprietary software
Equipped with proprietary software for multiple processes such as reactive sputtering and etching. Users can freely create and edit discriminant and computing formulas.

5. Light receiving unit
Two types of light receiving units are available: an atmosphere type and a vacuum type. Select one according to the process.

Sales plan and prices

We expect to sell 20 units of the Optius optical process monitor during the first year. The price will be from 2,300,000 yen (including a light receiving unit). This product will be on sale starting April 10, 2014.

About ULVAC, Inc.

ULVAC, Inc., is a Japan-based vacuum equipment manufacturer. ULVAC was founded in 1952 and has contributed to development of industry and technology through comprehensive use of vacuum technology and its peripheral technology. We created "ULVAC SOLUTIONS" based on our one of a kind technologies built upon long years of research, development, and production technology innovations. We offer this solution composed of equipment, materials, analytic evaluation, vacuum components and other various services, for flat panel displays, solar cells, semiconductors, electronic components, and general industrial equipment. For more information, please visit www.ulvac.co.jp/eng/ .

Source: ULVAC, Inc.

Contact:
ULVAC, Inc.
Components Division
TEL: +81-467-89-2185
http://www.ulvac.co.jp/eng/




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